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Difference between revisions of "45 nm lithography process"

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Revision as of 18:41, 14 April 2016

The 45 nm lithography process is a full node semiconductor manufacturing process following the 65 nm process. Commercial integrated circuit manufacturing using 45 nm process began in 2007. This technology was superseded by the 40 nm process (HN) / 32 nm process (FN) in 2010.

45 nm Microprocessors

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45 nm System on Chips

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45 nm Microarchitectures

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