Semiconductor & Computer Engineering
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Difference between revisions of "22 nm lithography process"
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| − | The '''22 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[28 nm lithography process|28 nm process]]. Commercial [[integrated circuit]] manufacturing using 22 nm process began in 2008 for memory and 2012 for [[MPU]]s. This technology was replaced by with [[20 nm lithography process|20 nm process]] (HN) in 2014 and [[16 nm lithography process|16 nm process]] (FN) in late 2015. | + | The '''22 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[28 nm lithography process|28 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 22 nm process began in 2008 for memory and 2012 for [[MPU]]s. This technology was replaced by with [[20 nm lithography process|20 nm process]] (HN) in 2014 and [[16 nm lithography process|16 nm process]] (FN) in late 2015. |
== 22 nm Microprocessors== | == 22 nm Microprocessors== | ||
Revision as of 19:53, 13 April 2016
Semiconductor lithography processes technology
The 22 nm lithography process is a full node semiconductor manufacturing process following the 28 nm process stopgap. Commercial integrated circuit manufacturing using 22 nm process began in 2008 for memory and 2012 for MPUs. This technology was replaced by with 20 nm process (HN) in 2014 and 16 nm process (FN) in late 2015.
22 nm Microprocessors
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22 nm System on Chips
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22 nm Microarchitectures
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