From WikiChip
Difference between revisions of "800 nm lithography process"
(→800 nm Microprocessors) |
|||
Line 39: | Line 39: | ||
* AMD | * AMD | ||
** {{amd|80386}} | ** {{amd|80386}} | ||
+ | ** {{amd|Am286ZX/LX}} | ||
* Sun | * Sun | ||
** {{sun|microSPARC I}}, 1992 | ** {{sun|microSPARC I}}, 1992 |
Revision as of 04:01, 24 May 2016
The 800 nanometer (800 nm) lithography process was a semiconductor manufacturing process used by a variety of integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
Metal Layers |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel (BICMOS) | Intel (CHMOS V) | TI (CMOS) | TI (BiCMOS) | Cypress | AMD | Motorola | NEC | HP | HP | National (ASIC BiCMOS) | National (Memory BiCMOS) | |
---|---|---|---|---|---|---|---|---|---|---|---|---|
P650 | CMOS26B | CMOS26G | ABiC IV | BiCMOS III | ||||||||
1991 | 1989 | 1991 | 1991 | 1989 | 1989 | 1991 | 1991 | 1991 | 1990 | 1990 | ||
3 | 2 | 2 | 2 | 3 | 2 | 3 | 4 | 2 | ||||
Value | Value | 1 µm Δ | Value | Value | Value | Value | Value | Value | Value | Value | Value | Value |
? nm | ? nm | ?x | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ?x | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | 2.5 µm | 1.8 µm |
? µm2 | 111 µm2 | 0.50x | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | 100 µm2 | ? µm2 |
800 nm Microprocessors
- Intel
- AMD
- Sun
- microSPARC I, 1992
- SuperSPARC II
- HP
- Motorola
- Cypress
- MIPS
This list is incomplete; you can help by expanding it.