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Difference between revisions of "6 µm lithography process"
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Latest revision as of 22:04, 20 May 2018
Semiconductor lithography processes technology |
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The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.
Industry[edit]
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Wafer |
Intel | Motorola | AMI | AMD |
---|---|---|---|
1971 | 1971 | ||
? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ? nm | ? nm |
2 | 2 | ||
nMOS/pMOS | depletion-mode nMOS | nMOS/pMOS/CMOS | |
3" |
6μm Microprocessors[edit]
This list is incomplete; you can help by expanding it.
6μm Chips[edit]
- Intel
This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information. |