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Difference between revisions of "6 µm lithography process"

(Industry)
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  |Metal Layers
 
  |Metal Layers
 
  |Technology
 
  |Technology
 +
|Wafer
 
}}
 
}}
 
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|-
 
| nMOS || depletion-mode nMOS
 
| nMOS || depletion-mode nMOS
 +
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| 76 mm ||
 
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== Microprocessors ==
 
== Microprocessors ==
 
* Intel
 
* Intel

Revision as of 05:42, 26 April 2016

The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology​
Wafer
Intel Motorola
 
1971 1971
 ? nm  ? nm
 ? nm  ? nm
2 2
nMOS depletion-mode nMOS
76 mm

Microprocessors

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