Semiconductor & Computer Engineering
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Difference between revisions of "600 nm lithography process"
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! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] | ! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] | ||
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | || || || CMOS-4S || | + | | || P852 || || CMOS-4S || |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| 1994 || 1994 || 1992 || 1993 || 1994 | | 1994 || 1994 || 1992 || 1993 || 1994 | ||
Revision as of 19:43, 24 April 2016
Semiconductor lithography processes technology
The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola |
|---|---|---|---|---|
| P852 | CMOS-4S | |||
| 1994 | 1994 | 1992 | 1993 | 1994 |
| Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
600 nm Microprocessors
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600 nm Microarchitectures
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