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Difference between revisions of "600 nm lithography process"
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− | | ? µm<sup>2</sup> | + | | ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> |
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Revision as of 18:46, 24 April 2016
The 600 nm lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola |
---|---|---|---|---|
CMOS-4S | ||||
1994 | 1994 | 1992 | 1993 | 1994 |
Value | Value | Value | Value | Value |
? nm | ? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ? nm | ? nm | ? nm |
? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
600 nm Microprocessors
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600 nm Microarchitectures
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