Semiconductor & Computer Engineering
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Difference between revisions of "7 nm lithography process"
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{{lithography processes}} | {{lithography processes}} | ||
The '''7 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[10 nm lithography process|10 nm process]] node. Commercial [[integrated circuit]] manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by [[5 nm lithography process|5 nm process]] around 2022. | The '''7 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[10 nm lithography process|10 nm process]] node. Commercial [[integrated circuit]] manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by [[5 nm lithography process|5 nm process]] around 2022. | ||
| + | |||
| + | == Industry == | ||
| + | {{scrolling table/top|style=text-align: right; | first=Fab | ||
| + | |Process Name | ||
| + | |1st Production | ||
| + | | | ||
| + | |Fin Pitch | ||
| + | |Fin Width | ||
| + | |Fin Height | ||
| + | |Contacted Gate Pitch | ||
| + | |Interconnect Pitch (M1P) | ||
| + | |SRAM bit cell (HP) | ||
| + | |SRAM bit cell (HD) | ||
| + | }} | ||
| + | {{scrolling table/mid}} | ||
| + | |- | ||
| + | ! colspan="2" | [[Intel]] !! colspan="2" | [[Samsung]] !! colspan="2" | [[TSMC]] | ||
| + | |- style="text-align: center;" | ||
| + | | colspan="2" | P1276 || colspan="2" | || colspan="2" | | ||
| + | |- style="text-align: center;" | ||
| + | | colspan="2" | || colspan="2" | || colspan="2" | | ||
| + | |- | ||
| + | ! Value !! [[10 nm]] Δ !! Value !! [[10 nm]] Δ !! Value !! [[10 nm]] Δ | ||
| + | |- | ||
| + | | ? nm || ?x || ? nm || ?x || ? nm || ?x | ||
| + | |- | ||
| + | | ? nm || ?x || ? nm || ?x || ? nm || ?x | ||
| + | |- | ||
| + | | ? nm || ?x || ? nm || ?x || ? nm || ?x | ||
| + | |- | ||
| + | | ? nm || ?x || ? nm || ?x || ? nm || ?x | ||
| + | |- | ||
| + | | ? nm || ?x || ? nm || ?x || ? nm || ?x | ||
| + | |- | ||
| + | | ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x | ||
| + | |- | ||
| + | | ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x || ? µm<sup>2</sup> || ?x | ||
| + | {{scrolling table/end}} | ||
== 7 nm Microprocessors== | == 7 nm Microprocessors== | ||
Revision as of 21:39, 26 April 2016
Semiconductor lithography processes technology
The 7 nm lithography process is a full node semiconductor manufacturing process following the 10 nm process node. Commercial integrated circuit manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by 5 nm process around 2022.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Fin Pitch |
| Fin Width |
| Fin Height |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell (HP) |
| SRAM bit cell (HD) |
| Intel | Samsung | TSMC | |||
|---|---|---|---|---|---|
| P1276 | |||||
| Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? µm2 | ?x | ? µm2 | ?x | ? µm2 | ?x |
| ? µm2 | ?x | ? µm2 | ?x | ? µm2 | ?x |
7 nm Microprocessors
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7 nm System on Chips
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7 nm Microarchitectures
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