Semiconductor & Computer Engineering
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Difference between revisions of "16 nm lithography process"
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| − | The '''16 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[20 nm lithography process|20 nm process]]. Commercial [[integrated circuit]] manufacturing using 16 nm process began in 2014. This technology is set to replaced by with [[14 nm lithography process|14 nm process]] (HN) (2014) and [[10 nm lithography process|10 nm process]] (FN) in 2017. | + | The '''16 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[20 nm lithography process|20 nm process]] stopgap. Commercial [[integrated circuit]] manufacturing using 16 nm process began in 2014. This technology is set to replaced by with [[14 nm lithography process|14 nm process]] (HN) (2014) and [[10 nm lithography process|10 nm process]] (FN) in 2017. |
== 16 nm Microprocessors== | == 16 nm Microprocessors== | ||
Revision as of 19:46, 13 April 2016
Semiconductor lithography processes technology
The 16 nm lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. This technology is set to replaced by with 14 nm process (HN) (2014) and 10 nm process (FN) in 2017.
16 nm Microprocessors
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16 nm System on Chips
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16 nm Microarchitectures
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