From WikiChip
Difference between revisions of "6 µm lithography process"

(Microprocessors)
Line 1: Line 1:
 
{{Lithography processes}}
 
{{Lithography processes}}
The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of 1973 and 1975.
+
The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes.
  
 +
== Industry ==
 +
{{scrolling table/top|style=text-align: right; | first=Fab
 +
|Process Name
 +
|1st Production
 +
|Contacted Gate Pitch
 +
|Interconnect Pitch
 +
|Metal Layers
 +
|Technology
 +
}}
 +
{{scrolling table/mid}}
 +
|-
 +
! [[Intel]] !! [[Motorola]]
 +
|- style="text-align: center;"
 +
|  ||  
 +
|- style="text-align: center;"
 +
| 1971 || 1971
 +
|-
 +
| ? nm  || ? nm
 +
|-
 +
| ? nm  || ? nm
 +
|-
 +
| 2 || 2
 +
|-
 +
| nMOS || depletion-mode nMOS
 +
{{scrolling table/end}}
 
== Microprocessors ==
 
== Microprocessors ==
* {{intel|MCS-80|Intel 8080}}
+
* Intel
 +
** {{intel|MCS-80|8080}}
 +
* Motorola
 +
** {{motorola|6800}}
 +
{{expand list}}
  
  
 
{{stub}}
 
{{stub}}
 
[[Category:Lithography]]
 
[[Category:Lithography]]

Revision as of 05:24, 26 April 2016

The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology
Intel Motorola
 
1971 1971
 ? nm  ? nm
 ? nm  ? nm
2 2
nMOS depletion-mode nMOS

Microprocessors

This list is incomplete; you can help by expanding it.


Text document with shapes.svg This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information.