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Difference between revisions of "6 µm lithography process"
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{{Lithography processes}} | {{Lithography processes}} | ||
− | The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of | + | The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes. |
+ | == Industry == | ||
+ | {{scrolling table/top|style=text-align: right; | first=Fab | ||
+ | |Process Name | ||
+ | |1st Production | ||
+ | |Contacted Gate Pitch | ||
+ | |Interconnect Pitch | ||
+ | |Metal Layers | ||
+ | |Technology | ||
+ | }} | ||
+ | {{scrolling table/mid}} | ||
+ | |- | ||
+ | ! [[Intel]] !! [[Motorola]] | ||
+ | |- style="text-align: center;" | ||
+ | | || | ||
+ | |- style="text-align: center;" | ||
+ | | 1971 || 1971 | ||
+ | |- | ||
+ | | ? nm || ? nm | ||
+ | |- | ||
+ | | ? nm || ? nm | ||
+ | |- | ||
+ | | 2 || 2 | ||
+ | |- | ||
+ | | nMOS || depletion-mode nMOS | ||
+ | {{scrolling table/end}} | ||
== Microprocessors == | == Microprocessors == | ||
− | * {{intel|MCS-80| | + | * Intel |
+ | ** {{intel|MCS-80|8080}} | ||
+ | * Motorola | ||
+ | ** {{motorola|6800}} | ||
+ | {{expand list}} | ||
{{stub}} | {{stub}} | ||
[[Category:Lithography]] | [[Category:Lithography]] |
Revision as of 06:24, 26 April 2016
The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the years of mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.
Industry
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Microprocessors
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