Latest revision as of 04:54, 20 July 2018

Semiconductor lithography processes technology

1 nm 2 nm 3 nm 5 nm 7 nm 10 nm 14 nm 16 nm 20 nm 22 nm 28 nm 32 nm 40 nm 45 nm 55 nm 65 nm 80 nm 90 nm 110 nm 130 nm 150 nm 180 nm 220 nm 240 nm 250 nm 280 nm 350 nm 500 nm 600 nm 650 nm 700 nm 750 nm 800 nm 1 µm 1.2 µm 1.3 µm 1.5 µm 2 µm 2.5 µm 3 µm 3.5 µm 5 µm 6 µm 7 µm 8 µm 10 µm 16 µm 20 µm 50 µm

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The 55 nanometer (55 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 65 nm and 45 nm processes. Commercial integrated circuit manufacturing using 55 nm process began in late 2006 by companies such as TSMC and NEC. This technology superseded by commercial 45 nm process.

List of 55 nm microprocessors[edit]

• Marvell
  • ARMADA

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