Latest revision as of 04:55, 20 July 2018

Semiconductor lithography processes technology

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The 65 nanometer (65 nm) lithography process is a full node semiconductor manufacturing process following the 80 nm process stopgap. Commercial integrated circuit manufacturing using 65 nm process began in 2005. This technology was superseded by the 55 nm process (HN) / 45 nm process (FN) in 2007.

Industry[edit]

Design Rules[edit]

65 nm Microprocessors[edit]

• AMD
  • Athlon 64 X2
  • Athlon X2
  • Opteron
  • Phenom
  • Turion 64 X2
• Fujitsu
  • SPARC64 VII
• IBM
  • Power6
• Intel
  • Celeron
  • Core 2 Duo
  • Core 2 Extreme
  • Core 2 Quad
  • Core 2 Quad Extreme
  • Core Duo
  • Pentium 4
  • Pentium D
  • Pentium Extreme Edition
  • Pentium Dual-Core
  • Xeon
• Loongson
  • Godson 2
• Qualcomm
  • MSM6xxx
• Sun
  • UltraSPARC T2

This list is incomplete; you can help by expanding it.

65 nm Microarchitectures[edit]

• AMD
  • K8
  • K10
• ARM
  • ARM7
• IBM
  • z10
• Intel
  • Core
• Movidius
  • SHAVE v2.0
• VIA Technologies
  • Isaiah

This list is incomplete; you can help by expanding it.

Documents[edit]

• Samsung foundry - 45 nm, 65 nm, 90 nm guide (August, 2007)