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Difference between revisions of "1 µm lithography process"
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Latest revision as of 22:04, 20 May 2018
The 1 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 800 nm, 700 nm, 650 nm, and 600 nm processes.
Industry[edit]
Fab |
---|
Process Name |
1st Production |
Technology |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Intel | Intel | HP | National |
---|---|---|---|
HMOS-III | P648 (CHMOS IV) | CMOS26 | BiCMOS III |
1984 | 1987 | 1991 | 1988 |
nMOS | CMOS | CMOS | BiCMOS |
Value | Value | Value | Value |
? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ? nm | ? nm |
? µm2 | 220 µm2 | ? µm2 | ? µm2 |
1 µm Microprocessors[edit]
This list is incomplete; you can help by expanding it.
1 µm Microcontrollers[edit]
- Intel
This list is incomplete; you can help by expanding it.
1 µm Microarchitectures[edit]
- Intel
This list is incomplete; you can help by expanding it.