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Difference between revisions of "650 nm lithography process"

(650 nm Microprocessors)
 
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{{lithography processes}}
 
{{lithography processes}}
The '''650 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes.
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The '''650 nanometer (650 nm) lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes.
  
 
== Industry ==
 
== Industry ==
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| ? nm  || ? nm || ? nm || ? nm || ? nm
 
| ? nm  || ? nm || ? nm || ? nm || ? nm
 
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| ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup> ||  ? µm<sup>2</sup>
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| ? µm² ||  ? µm² ||  ? µm² ||  ? µm² ||  ? µm²
 
{{scrolling table/end}}
 
{{scrolling table/end}}
  
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* Ross
 
* Ross
 
** {{ross|hyperSPARC}}
 
** {{ross|hyperSPARC}}
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[[category:lithography]]

Latest revision as of 06:15, 20 July 2018

The 650 nanometer (650 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.

Industry[edit]

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Cypress IDT TI IBM Motorola
 
1992 1993 1993 1995 1995
Value Value Value Value Value
 ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm²  ? µm²  ? µm²  ? µm²  ? µm²

650 nm Microprocessors[edit]