Semiconductor & Computer Engineering
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Difference between revisions of "600 nm lithography process"
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| − | The '''600 nm lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes. | + | The '''600 nanometer (600 nm) lithography process''' was a semiconductor manufacturing process used by some [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[500 nm]] and [[350 nm]] processes. |
== Industry == | == Industry == | ||
| Line 13: | Line 13: | ||
{{scrolling table/mid}} | {{scrolling table/mid}} | ||
|- | |- | ||
| − | ! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] | + | ! [[Intel]] (BiCMOS) !! [[Intel]] (CMOS) !! [[NEC]] !! [[IBM]] !! [[Motorola]] !! [[HP]] |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | || | + | | || P652, P653 || || CMOS-4S || || CMOS14B |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | 1994 || 1994 || 1992 || 1993 || 1994 | + | | 1994 || 1994 || 1992 || 1993 || 1994 || |
|- | |- | ||
| − | ! Value !! Value !! Value !! Value !! Value | + | ! Value !! Value !! Value !! Value !! Value !! Value |
|- | |- | ||
| − | | ? nm || ? nm || ? nm || ? nm || ? nm | + | | ? nm || ? nm || ? nm || ? nm || ? nm || ? nm |
|- | |- | ||
| − | | ? nm || ? nm || ? nm || ? nm || ? nm | + | | ? nm || ? nm || ? nm || ? nm || ? nm || ? nm |
|- | |- | ||
| − | | ? | + | | ? µm² || ? µm² || ? µm² || ? µm² || ? µm² || ? µm² |
{{scrolling table/end}} | {{scrolling table/end}} | ||
| Line 33: | Line 33: | ||
** {{intel|Pentium Overdrive}} | ** {{intel|Pentium Overdrive}} | ||
** {{intel|Pentium Pro}} | ** {{intel|Pentium Pro}} | ||
| + | * MIPS | ||
| + | ** {{mips|R4400}} | ||
{{expand list}} | {{expand list}} | ||
== 600 nm Microarchitectures == | == 600 nm Microarchitectures == | ||
| + | * Intel | ||
| + | ** {{intel|microarchitectures/80486|80486}} (later models) | ||
| + | ** {{intel|microarchitectures/p5|P5}} | ||
{{expand list}} | {{expand list}} | ||
| + | |||
| + | [[category:lithography]] | ||
Latest revision as of 05:15, 20 July 2018
Semiconductor lithography processes technology
The 600 nanometer (600 nm) lithography process was a semiconductor manufacturing process used by some integrated circuit manufacturers in early 1990s. This process was later replaced by 500 nm and 350 nm processes.
Industry[edit]
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BiCMOS) | Intel (CMOS) | NEC | IBM | Motorola | HP |
|---|---|---|---|---|---|
| P652, P653 | CMOS-4S | CMOS14B | |||
| 1994 | 1994 | 1992 | 1993 | 1994 | |
| Value | Value | Value | Value | Value | Value |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm² | ? µm² | ? µm² | ? µm² | ? µm² | ? µm² |
600 nm Microprocessors[edit]
- Intel
- MIPS
This list is incomplete; you can help by expanding it.
600 nm Microarchitectures[edit]
This list is incomplete; you can help by expanding it.