Latest revision as of 05:20, 20 July 2018

Semiconductor lithography processes technology

1 nm 2 nm 3 nm 5 nm 7 nm 10 nm 14 nm 16 nm 20 nm 22 nm 28 nm 32 nm 40 nm 45 nm 55 nm 65 nm 80 nm 90 nm 110 nm 130 nm 150 nm 180 nm 220 nm 240 nm 250 nm 280 nm 350 nm 500 nm 600 nm 650 nm 700 nm 750 nm 800 nm 1 µm 1.2 µm 1.3 µm 1.5 µm 2 µm 2.5 µm 3 µm 3.5 µm 5 µm 6 µm 7 µm 8 µm 10 µm 16 µm 20 µm 50 µm

v · d · e

The 2.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by 2 µm, 1.5 µm, and 1 µm processes.

Industry[edit]

Harris[edit]

Harris Corporation operated a 2.5 μm CMOS process, SAJI IV (Self-Aligned) .

2.5 μm microprocessors[edit]

• DEC
  • J11

2.5 μm microcontrollers[edit]

• Bell Labs BELLMAC-32 (BELLMAC-80)

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