Semiconductor & Computer Engineering
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Difference between revisions of "2.5 µm lithography process"
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{{Lithography processes}} | {{Lithography processes}} | ||
The '''2.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by [[2 µm]], [[1.5 µm]], and [[1 µm]] processes. | The '''2.5 μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by [[2 µm]], [[1.5 µm]], and [[1 µm]] processes. | ||
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| + | == Industry == | ||
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| + | === Harris === | ||
| + | Harris Corporation operated a 2.5 μm CMOS process, '''SAJI IV''' (Self-Aligned) . | ||
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| + | == 2.5 μm microprocessors == | ||
| + | * {{decc|J11}} | ||
== 2.5 μm microcontrollers == | == 2.5 μm microcontrollers == | ||
* {{bell|BELLMAC-32|Bell Labs BELLMAC-32 (BELLMAC-80)}} | * {{bell|BELLMAC-32|Bell Labs BELLMAC-32 (BELLMAC-80)}} | ||
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Revision as of 15:08, 11 June 2017
Semiconductor lithography processes technology
The 2.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the late 1970s to early 1980s. This process was later superseded by 2 µm, 1.5 µm, and 1 µm processes.
Industry
Harris
Harris Corporation operated a 2.5 μm CMOS process, SAJI IV (Self-Aligned) .
2.5 μm microprocessors
2.5 μm microcontrollers
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