Semiconductor & Computer Engineering
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Difference between revisions of "1.3 µm lithography process"
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|Process Name | |Process Name | ||
|1st Production | |1st Production | ||
| + | |Voltage | ||
| | | | ||
| − | | | + | |Gate Length |
|Interconnect Pitch (M1P) | |Interconnect Pitch (M1P) | ||
|SRAM bit cell | |SRAM bit cell | ||
| Line 13: | Line 14: | ||
{{scrolling table/mid}} | {{scrolling table/mid}} | ||
|- | |- | ||
| − | ! [[Motorola]] !! [[Hitachi]] !! [[Fujitsu]] | + | ! [[Motorola]] !! colspan="2" | [[Hitachi]] !! [[Fujitsu]] |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | || || | + | | || colspan="2" | Hi-CMOS III || |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | 1987 || 1987 || | + | | 1987 || colspan="2" | 1987 || |
|- | |- | ||
| − | + | | || colspan="2" | 5 V || | |
|- | |- | ||
| − | + | ! Value !! Value !! [[2 µm]] Δ !! Value | |
|- | |- | ||
| − | | ? nm || | + | | ? nm || 1.2 µm || 0.60x || ? nm |
|- | |- | ||
| − | | ? µm | + | | ? nm || 1.3 µm || 0.43x || nm |
| + | |- | ||
| + | | ? µm² || ? µm² || || ? µm² | ||
{{scrolling table/end}} | {{scrolling table/end}} | ||
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** {{sun|MB86900}} | ** {{sun|MB86900}} | ||
{{expand list}} | {{expand list}} | ||
| + | |||
| + | == References== | ||
| + | * Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984. | ||
[[Category:Lithography]] | [[Category:Lithography]] | ||
Revision as of 08:35, 7 April 2017
Semiconductor lithography processes technology
The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Voltage |
| |
| Gate Length |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Motorola | Hitachi | Fujitsu | |
|---|---|---|---|
| Hi-CMOS III | |||
| 1987 | 1987 | ||
| 5 V | |||
| Value | Value | 2 µm Δ | Value |
| ? nm | 1.2 µm | 0.60x | ? nm |
| ? nm | 1.3 µm | 0.43x | nm |
| ? µm² | ? µm² | ? µm² | |
1.3 µm Microprocessors
This list is incomplete; you can help by expanding it.
References
- Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984.