Revision as of 19:19, 6 September 2016

Semiconductor lithography processes technology

1 nm • 18A 2 nm • 3 nm 5 nm • 7 nm 10 nm • 12 nm 14 nm • 16 nm 20 nm • 22 nm 28 nm • 32 nm 40 nm • 45 nm 55 nm • 65 nm 80 nm • 90 nm 110 nm • 130 nm 150 nm • 180 nm 220 nm • 240 nm 250 nm • 280 nm 350 nm • 500 nm 600 nm • 650 nm 700 nm • 750 nm 800 nm 1 µm • 1.2 µm 1.3 µm • 1.5 µm 2 µm • 2.5 µm 3 µm • 3.5 µm 5 µm • 6 µm 7 µm • 8 µm 10 µm • 16 µm 20 µm • 50 µm

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The 28 nanometer (28 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 32 nm and 22 nm processes. Commercial integrated circuit manufacturing using 28 nm process began in 2011. This technology superseded by commercial 22 nm process.

Industry

28 nm Microprocessors

• AMD
  • A8
  • A10
• Phytium
  • FT-1500A
• PEZY
  • PEZY-SC
  • PEZY-SCnp

This list is incomplete; you can help by expanding it.

28 nm System on Chips

• Intel (Fab'ed by TSMC)
  • Atom x3

This list is incomplete; you can help by expanding it.

28 nm Microarchitectures

• AMD
  • Steamroller
  • Excavator

This list is incomplete; you can help by expanding it.