Semiconductor & Computer Engineering
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Difference between revisions of "700 nm lithography process"
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| − | The '''700 nm lithography process''' is was semiconductor manufacturing process following the [[1 µm lithography process|1 µm process]]. Commercial [[integrated circuit]] manufacturing using 700 nm process began in early 1990s. 700 nm and was phased out and later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes. | + | The '''700 nanometer (700 nm) lithography process''' is was semiconductor manufacturing process following the [[1 µm lithography process|1 µm process]]. Commercial [[integrated circuit]] manufacturing using 700 nm process began in early 1990s. 700 nm and was phased out and later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes. |
== Industry == | == Industry == | ||
Revision as of 03:53, 24 May 2016
Semiconductor lithography processes technology
The 700 nanometer (700 nm) lithography process is was semiconductor manufacturing process following the 1 µm process. Commercial integrated circuit manufacturing using 700 nm process began in early 1990s. 700 nm and was phased out and later replaced by 650 nm, 600 nm, and 500 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| Metal Layers |
| SRAM bit cell |
| AMD |
|---|
| 1993 |
| ? nm |
| ? nm |
| 3 |
| ? µm2 |
700 nm Microprocessors
- AMD
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