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Difference between revisions of "800 nm lithography process"
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|Process Name | |Process Name | ||
|1st Production | |1st Production | ||
| − | |||
|Contacted Gate Pitch | |Contacted Gate Pitch | ||
|Interconnect Pitch (M1P) | |Interconnect Pitch (M1P) | ||
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{{scrolling table/mid}} | {{scrolling table/mid}} | ||
|- | |- | ||
| − | ! [[Intel]] (BICMOS) !! [[Intel]] (CHMOS V) !! colspan="2" | [[Intel]] (CMOS) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] !! [[HP]] | + | ! [[Intel]] (BICMOS) !! [[Intel]] (CHMOS V) !! colspan="2" | [[Intel]] (CMOS) !! [[TI]] (CMOS) !! [[TI]] (BiCMOS) !! [[Cypress]] !! [[AMD]] !! [[Motorola]] !! [[NEC]] !! [[HP]] !! [[HP]] !! [[National Semiconductor|National]] (BiCMOS) |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | || || colspan="2" | P650 || || || || || || || CMOS26B || CMOS26G | + | | || || colspan="2" | P650 || || || || || || || CMOS26B || CMOS26G || ABiC IV |
|- style="text-align: center;" | |- style="text-align: center;" | ||
| − | | 1991 || 1990 || colspan="2" | 1989 || 1991 || 1991 || 1989 || 1991 || 1991 || 1991 || 1991 || | + | | 1991 || 1990 || colspan="2" | 1989 || 1991 || 1991 || 1989 || 1991 || 1991 || 1991 || 1991 || || 1991 |
|- | |- | ||
| − | + | | ? nm || ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm | |
|- | |- | ||
| − | | ? nm || ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm | + | | ? nm || ? nm || ? nm || ?x || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm || ? nm |
|- | |- | ||
| − | + | | ? µm<sup>2</sup> || ? µm<sup>2</sup> || 111 µm<sup>2</sup> || 0.50x || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> | |
| − | |||
| − | | ? µm<sup>2</sup> || ? µm<sup>2</sup> || 111 µm<sup>2</sup> || 0.50x || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> || ? µm<sup>2</sup> | ||
{{scrolling table/end}} | {{scrolling table/end}} | ||
Revision as of 06:07, 27 April 2016
Semiconductor lithography processes technology
The 800 nm lithography process was a semiconductor manufacturing process used by the leading integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell |
| Intel (BICMOS) | Intel (CHMOS V) | Intel (CMOS) | TI (CMOS) | TI (BiCMOS) | Cypress | AMD | Motorola | NEC | HP | HP | National (BiCMOS) | |
|---|---|---|---|---|---|---|---|---|---|---|---|---|
| P650 | CMOS26B | CMOS26G | ABiC IV | |||||||||
| 1991 | 1990 | 1989 | 1991 | 1991 | 1989 | 1991 | 1991 | 1991 | 1991 | 1991 | ||
| ? nm | ? nm | ? nm | ?x | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? nm | ? nm | ? nm | ?x | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm | ? nm |
| ? µm2 | ? µm2 | 111 µm2 | 0.50x | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 | ? µm2 |
800 nm Microprocessors
- Intel
- AMD
- Sun
- microSPARC I, 1992
- SuperSPARC II
- HP
- Motorola
- Cypress
- MIPS
This list is incomplete; you can help by expanding it.