From WikiChip
Difference between revisions of "6 µm lithography process"
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| − | The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the | + | The '''6μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by [[5 µm]], [[3 µm]], and [[2 µm]] processes. |
== Industry == | == Industry == | ||
Revision as of 06:45, 26 April 2016
The 6μm lithography process was the semiconductor process technology used by some semiconductor companies during the early to mid 1970s. This process was later superseded by 5 µm, 3 µm, and 2 µm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch |
| Metal Layers |
| Technology |
| Wafer |
Microprocessors
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