From WikiChip
Difference between revisions of "2 µm lithography process"

Line 1: Line 1:
{{Lithography processes}}
+
{{lithography processes}}
The '''2μm lithography process''' was the semiconductor process technology used by some semiconductor companies during the 1980s.
+
The '''2 µm lithography process''' was the semiconductor process technology used by the some semiconductor companies in the early 1980s. By the mid 80s this process was replaced by [[1.5 µm]], [[1.3 µm]], and [[1.2 µm]] processes.
 +
 
 +
== Industry ==
 +
{{scrolling table/top|style=text-align: right; | first=Fab
 +
|Process Name
 +
|1st Production
 +
| 
 +
|Contacted Gate Pitch
 +
|Interconnect Pitch (M1P)
 +
|SRAM bit cell
 +
}}
 +
{{scrolling table/mid}}
 +
|-
 +
! [[Toshiba]] || [[STMicro]]
 +
|- style="text-align: center;"
 +
|  ||
 +
|- style="text-align: center;"
 +
| 1986 || 1992
 +
|-
 +
! Value !! Value
 +
|-
 +
| ? nm  || ? nm
 +
|-
 +
| ? nm  || ? nm
 +
|-
 +
| ? µm<sup>2</sup> ||  ? µm<sup>2</sup>
 +
{{scrolling table/end}}
  
 
== Microprocessors ==
 
== Microprocessors ==
* [[Motorola 68020]]
+
* Motorola
 +
** {{motorola|68020}}
 +
* MIPS
 +
** {{mips|R2000}}
 +
{{expand list}}
 +
 
  
{{stub}}
 
 
[[Category:Lithography]]
 
[[Category:Lithography]]

Revision as of 07:10, 25 April 2016

The 2 µm lithography process was the semiconductor process technology used by the some semiconductor companies in the early 1980s. By the mid 80s this process was replaced by 1.5 µm, 1.3 µm, and 1.2 µm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Toshiba STMicro
1986 1992
Value Value
 ? nm  ? nm
 ? nm  ? nm
 ? µm2  ? µm2

Microprocessors

This list is incomplete; you can help by expanding it.