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Difference between revisions of "2 µm lithography process"
m (Inject moved page 2μm lithography process to 2 µm lithography process) |
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− | {{ | + | {{lithography processes}} |
− | The ''' | + | The '''2 µm lithography process''' was the semiconductor process technology used by the some semiconductor companies in the early 1980s. By the mid 80s this process was replaced by [[1.5 µm]], [[1.3 µm]], and [[1.2 µm]] processes. |
+ | |||
+ | == Industry == | ||
+ | {{scrolling table/top|style=text-align: right; | first=Fab | ||
+ | |Process Name | ||
+ | |1st Production | ||
+ | | | ||
+ | |Contacted Gate Pitch | ||
+ | |Interconnect Pitch (M1P) | ||
+ | |SRAM bit cell | ||
+ | }} | ||
+ | {{scrolling table/mid}} | ||
+ | |- | ||
+ | ! [[Toshiba]] || [[STMicro]] | ||
+ | |- style="text-align: center;" | ||
+ | | || | ||
+ | |- style="text-align: center;" | ||
+ | | 1986 || 1992 | ||
+ | |- | ||
+ | ! Value !! Value | ||
+ | |- | ||
+ | | ? nm || ? nm | ||
+ | |- | ||
+ | | ? nm || ? nm | ||
+ | |- | ||
+ | | ? µm<sup>2</sup> || ? µm<sup>2</sup> | ||
+ | {{scrolling table/end}} | ||
== Microprocessors == | == Microprocessors == | ||
− | * | + | * Motorola |
+ | ** {{motorola|68020}} | ||
+ | * MIPS | ||
+ | ** {{mips|R2000}} | ||
+ | {{expand list}} | ||
+ | |||
− | |||
[[Category:Lithography]] | [[Category:Lithography]] |
Revision as of 07:10, 25 April 2016
The 2 µm lithography process was the semiconductor process technology used by the some semiconductor companies in the early 1980s. By the mid 80s this process was replaced by 1.5 µm, 1.3 µm, and 1.2 µm processes.
Industry
Fab |
---|
Process Name |
1st Production |
|
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
Microprocessors
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