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Difference between revisions of "800 nm lithography process"

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{{lithography processes}}
 
{{lithography processes}}
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The '''650 nm lithography process''' was a semiconductor manufacturing process used by the leading [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes.
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The '''800 nm lithography process''' was a semiconductor manufacturing process used by the leading [[integrated circuit]] manufacturers in early 1990s. This process was later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes.
  
 
== Industry ==
 
== Industry ==

Revision as of 20:25, 24 April 2016

basic wafer drawing.svg Semiconductor lithography processes technology
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The 800 nm lithography process was a semiconductor manufacturing process used by the leading integrated circuit manufacturers in early 1990s. This process was later replaced by 650 nm, 600 nm, and 500 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (BICMOS) Intel (CHMOS V) Intel (CMOS) TI (CMOS) TI (BiCMOS) Cypress AMD Motorola NEC HP
P650 CMOS26B
1991 1990 1989 1991 1991 1989 1991 1991 1991 1991
Value Value Value Value Value Value Value Value Value Value
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm  ? nm
 ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2  ? µm2

800 nm Microprocessors

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