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From WikiChip
Difference between revisions of "32 nm lithography process"
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== 32 nm System on Chips== | == 32 nm System on Chips== | ||
+ | {{expand list}} | ||
+ | |||
+ | == 32 nm Microarchitectures == | ||
+ | * Intel: | ||
+ | ** {{intel|Saltwell}} | ||
+ | |||
{{expand list}} | {{expand list}} |
Revision as of 21:29, 13 April 2016
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The 32 nm lithography process is a full node semiconductor manufacturing process following the 40 nm process stopgap. Commercial integrated circuit manufacturing using 32 nm process began in 2010. This technology was superseded by the 28 nm process (HN) / 22 nm process (FN) in 2012.
32 nm Microprocessors
This list is incomplete; you can help by expanding it.
32 nm System on Chips
This list is incomplete; you can help by expanding it.
32 nm Microarchitectures
- Intel:
This list is incomplete; you can help by expanding it.