From WikiChip
Difference between revisions of "14 nm lithography process"
Line 1: | Line 1: | ||
{{lithography processes}} | {{lithography processes}} | ||
− | The '''14 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process | + | The '''14 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process used as a stopgap between the [[16 nm lithography process|16 nm]] and [[10 nm lithography process|10 nm]] processes. Commercial [[integrated circuit]] manufacturing using 14 nm process began in 2014. This technology is set to be replaced with [[10 nm lithography process|10 nm process]] in late 2016 or 2017. |
− | |||
== 14 nm Microprocessors== | == 14 nm Microprocessors== | ||
{{expand list}} | {{expand list}} |
Revision as of 19:45, 13 April 2016
The 14 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 16 nm and 10 nm processes. Commercial integrated circuit manufacturing using 14 nm process began in 2014. This technology is set to be replaced with 10 nm process in late 2016 or 2017.
14 nm Microprocessors
This list is incomplete; you can help by expanding it.
14 nm System on Chips
This list is incomplete; you can help by expanding it.
14 nm Microarchitectures
This list is incomplete; you can help by expanding it.