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Difference between revisions of "14 nm lithography process"

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{{lithography processes}}
 
{{lithography processes}}
The '''14 nm lithography process''' is a [[technology node|full node]] semiconductor manufacturing process following the [[16 nm lithography process|16 nm process]]. Commercial [[integrated circuit]] manufacturing using 14 nm process began in 2014. This technology is set to be replaced with [[10 nm lithography process|10 nm process]] in late 2016 or 2017.
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The '''14 nm lithography process''' is a [[technology node#half node|half-node]] semiconductor manufacturing process following the [[16 nm lithography process|16 nm process]]. Commercial [[integrated circuit]] manufacturing using 14 nm process began in 2014. This technology is set to be replaced with [[10 nm lithography process|10 nm process]] in late 2016 or 2017.
  
 
== 14 nm Microprocessors==
 
== 14 nm Microprocessors==

Revision as of 19:43, 13 April 2016

The 14 nm lithography process is a half-node semiconductor manufacturing process following the 16 nm process. Commercial integrated circuit manufacturing using 14 nm process began in 2014. This technology is set to be replaced with 10 nm process in late 2016 or 2017.

14 nm Microprocessors

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14 nm System on Chips

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14 nm Microarchitectures

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