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80 nm lithography process
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The 80 nanometer (80 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 90 nm and 65 nm processes. Commercial integrated circuit manufacturing using 40 nm process began around 2004. This technology superseded by commercial 65 nm process by 2006.

Industry[edit]

Fab
1st Production​
Wafer​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
TSMC Samsung
2005 2005
300mm
Value 90 nm Δ Value 90 nm Δ
 ? nm  ?x  ? nm  ?x
 ? nm  ?x  ? nm  ?x
 ? µm2  ?x  ? µm2  ?x

80 nm Microprocessors[edit]

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80 nm System on Chips[edit]

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