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Difference between revisions of "1 µm lithography process"

(Industry)
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{{lithography processes}}
 
{{lithography processes}}
The '''1 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by [[800 nm]], [[650 nm]], and [[600 nm]] processes.
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The '''1 µm lithography process''' was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by [[800 nm]], [[700 nm]], [[650 nm]], and [[600 nm]] processes.
  
 
== Industry ==
 
== Industry ==

Revision as of 02:13, 15 May 2016

The 1 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 800 nm, 700 nm, 650 nm, and 600 nm processes.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
Intel (CHMOS IV) HP National (BiCMOS)
P648 CMOS26 BiCMOS III
1987 1991 1988
Value Value Value
 ? nm  ? nm  ? nm
 ? nm  ? nm  ? nm
220 µm2  ? µm2  ? µm2

1 µm Microprocessors

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1 µm Microcontrollers

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