From WikiChip
750 nm lithography process
Revision as of 05:17, 20 July 2018 by Oleg3280 (talk | contribs) (category:lithography)
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)

The 750 nanometer (750 nm) lithography process is was semiconductor manufacturing process following the 1 µm process. Commercial integrated circuit manufacturing using 750 nm process began in early 1990s. 750 nm and was phased out and later replaced by 650 nm, 600 nm, and 500 nm processes.

Industry[edit]

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
Metal Layers​
SRAM bit cell
DEC HP
CMOS-4 CMOS26B
1992 1994
 ? nm  ? nm
 ? nm  ? nm
3 3
 ? µm2  ? µm2

750 nm Microprocessors[edit]

This list is incomplete; you can help by expanding it.

750 nm Microarchitectures[edit]

This list is incomplete; you can help by expanding it.