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From WikiChip
1.2 µm lithography process
Revision as of 22:04, 20 May 2018 by ChippyBot (talk | contribs) (Bot: Automated text replacement (-Category:Lithography +category:lithography))
(diff) ← Older revision | Latest revision (diff) | Newer revision → (diff)
Semiconductor lithography processes technology |
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The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.
Industry[edit]
Fab |
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Process Name |
1st Production |
Voltage |
|
Gate Length |
Interconnect Pitch (M1P) |
SRAM bit cell |
1.2 µm Microprocessors[edit]
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