The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.

Industry

Fab
Process Name​
1st Production​
Voltage​
​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

Intel	NEC	Hitachi
		Hi-CMOS III
1987	1988
		5 V
Value	Value	Value
? µm	? µm	1.2 µm
? µm	? µm	1.3 µm
? µm²	? µm²	? µm²

1.2 µm Microprocessors

• Intel
  • 80387 DX
• MIPS (Fab'ed by NEC)
  • R3000
• Qualcomm
  • MSM (prototype)

This list is incomplete; you can help by expanding it.

References

• Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984.