Semiconductor & Computer Engineering
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7 nm lithography process
Semiconductor lithography processes technology
The 7 nanometer (7 nm) lithography process is a full node semiconductor manufacturing process following the 10 nm process node. Commercial integrated circuit manufacturing using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by 5 nm process around 2022.
Industry
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Preliminary Data! Information presented in this article deal with future products, data, features, and specifications that have yet to be finalized, announced, or released. Information may be incomplete and can change by final release. |
| Fab |
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| Process Name |
| 1st Production |
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| Fin Pitch |
| Fin Width |
| Fin Height |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell (HP) |
| SRAM bit cell (HD) |
| Intel | Samsung | TSMC | |||
|---|---|---|---|---|---|
| P1276 | |||||
| Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | 48 nm[1] | ?x | ? nm | ?x |
| ? nm | ?x | 36 nm[2] | ?x | ? nm | ?x |
| ? µm2 | ?x | ? µm2 | ?x | ? µm2 | ?x |
| ? µm2 | ?x | ? µm2 | ?x | 0.027 µm2[3] | ?x |
7 nm Microprocessors
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7 nm System on Chips
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