The 150 nanometer (150 nm) lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 180 nm and 130 nm processes. Commercial integrated circuit manufacturing using 55 nm process began in early 2000s. This technology superseded by commercial 130 nm, 110 nm, and 90 nm processes.

Industry

Fab
Process Name​
1st Production​
Metal Layers​
​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

TSMC		Fujitsu
		CS-85
2000		2002
		6
Value	180 nm Δ	Value	180 nm Δ
? nm	?x	? nm	?x
? nm	?x	? nm	?x
3.42 µm2	0.74x	? µm2	?x

150 nm Microprocessors

• Cyrix
  • Cyrix III
• HAL (Fujitsu)
  • SPARC64 GP

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