The 500 nm lithography process is a full node semiconductor manufacturing process following the 600 nm process. Commercial integrated circuit manufacturing using 500 nm process began in 1992. 500 nm and was phased out and later replaced by 350 nm in 1995.

Industry

Fab
Process Name​
1st Production​
​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

Intel		AMD		DEC		Fujitsu		Hitachi		HP		IBM		TI
P852				CMOS-5						CMOS14C		CMOS-5X
1994		1993		1993		1994		1994		1996		1994		1995
Value	800 nm Δ	Value	800 nm Δ	Value	800 nm Δ	Value	800 nm Δ	Value	800 nm Δ	Value	800 nm Δ	Value	800 nm Δ	Value	800 nm Δ
? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x
? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x	? nm	?x
44 µm2	0.40x	? µm2	?x	? µm2	?x	? µm2	?x	? µm2	?x	? µm2	?x	? µm2	?x	? µm2	?x

500 nm Microprocessors

• Sun
  • microSPARC II, 1994

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500 nm Microarchitectures

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