From WikiChip
3.5 µm lithography process
Revision as of 22:43, 26 April 2016 by Inject (talk | contribs)

The 3.5 μm lithography process was the semiconductor process technology used by some semiconductor companies during the mid 1970s. This process was later superseded by 3 µm, 2 µm, and 1.5 µm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology​
Wafer
Motorola
 
 
 ? nm
 ? nm
 ?
nMOS
 ?"

3.5 μm microcontrollers

This list is incomplete; you can help by expanding it.


Text document with shapes.svg This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information.