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150 nm lithography process
Revision as of 20:31, 26 April 2016 by Inject (talk | contribs) (150 nm Microprocessors)

The 150 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 180 nm and 130 nm processes. Commercial integrated circuit manufacturing using 55 nm process began in early 2000s. This technology superseded by commercial 130 nm process by 2001.

Industry

Fab
Process Name​
1st Production​
 ​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell
TSMC
 
2000
Value 180 nm Δ
 ? nm  ?x
 ? nm  ?x
3.42 µm2 0.74x

150 nm Microprocessors

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