The 1.2 µm lithography process was the semiconductor process technology used by the major semiconductor companies between in the late 1980s. 1 µm was phased out in the early 1990s and was replaced by 1 µm, 800 nm, and 650 nm processes.

Industry

Fab
Process Name​
1st Production​
Voltage​
​
Gate Length​
Interconnect Pitch (M1P)​
SRAM bit cell

Motorola	Hitachi		Fujitsu
	Hi-CMOS III
1987	1987
	5 V
Value	Value	2 µm Δ	Value
? nm	1.2 µm	0.60x	? nm
? nm	1.3 µm	0.43x	nm
? µm²	? µm²		? µm²

1.3 µm Microprocessors

• Motorola
  • 68030, "Micro 32"
• Sun
  • MB86900

This list is incomplete; you can help by expanding it.

References

• Meguro, S., et al. "Hi-CMOS III technology." Electron Devices Meeting, 1984 International. IEEE, 1984.