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7 nm lithography process
The 7 nanometer (7 nm) lithography process is a full node semiconductor manufacturing process following the 10 nm process node. The term "7 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial mass production of integrated circuit using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by 5 nm process around 2022.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| |
| Fin Pitch |
| Fin Width |
| Fin Height |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| SRAM bit cell (HP) |
| SRAM bit cell (HD) |
| Intel | Samsung | TSMC | GlobalFoundries | IBM | |||||
|---|---|---|---|---|---|---|---|---|---|
| P1276 | |||||||||
| Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ |
| ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | 48 nm[1] | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? nm | ?x | 36 nm[2] | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
| ? µm² | ?x | ? µm² | ?x | ? µm² | ?x | ? µm² | ?x | ? µm² | ?x |
| ? µm² | ?x | ? µm² | ?x | 0.027 µm²[3] | ?x | ? µm² | ?x | ? µm² | ?x |
7 nm Microprocessors
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7 nm Microarchitectures
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References
- ↑ Samsung, IEEE International Electron Devices Meeting (IEDM) 2016
- ↑ Samsung, IEEE International Electron Devices Meeting (IEDM) 2016
- ↑ TSMC, IEEE International Electron Devices Meeting (IEDM) 2016