The 16 nm lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. The term "16 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. This technology is set to be replaced with 10 nm process in 2017.

Industry

Fab
Wafer​
​
Fin Pitch​
Fin Width​
Fin Height​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
SRAM bit cell

TSMC
300mm
Value	20 nm Δ
48 nm	N/A
? nm
? nm
90 nm	1.03x
64 nm	1.00x
0.07 µm2	0.55x

16 nm Microprocessors

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16 nm System on Chips

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16 nm Microarchitectures

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