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From WikiChip
220 nm lithography process
Revision as of 00:08, 27 April 2016 by Inject (talk | contribs) (Created page with "{{lithography processes}} The '''220 nm lithography process''' is was semiconductor manufacturing process following the 350 nm process. Commerci...")
 Semiconductor lithography processes technology
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The 220 nm lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 220 process began in late 1990s. 220 nm and was phased out and later replaced by 180 nm processes.
Industry
| Fab |
|---|
| Process Name |
| 1st Production |
| Contacted Gate Pitch |
| Interconnect Pitch (M1P) |
| Metal Layers |
| SRAM bit cell |
| Motorola |
|---|
| HiPerMOS 5 |
| 1999 |
| ? nm |
| ? nm |
| ? |
| ? µm2 |
220 nm Microprocessors
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220 nm Microarchitectures
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