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From WikiChip
240 nm lithography process
Revision as of 01:28, 27 April 2016 by Inject (talk | contribs) (Created page with "{{lithography processes}} The '''240 nm lithography process''' is was semiconductor manufacturing process following the 350 nm process. Commerci...")
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The 240 nm lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 240 process began in late 1990s. 240 nm and was phased out and later replaced by 220 nm and 180 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
Metal Layers |
SRAM bit cell |
Fujitsu |
---|
CS-70 |
1997 |
? nm |
? nm |
? |
? µm2 |
240 nm Microprocessors
- HAL (Fujitsu)
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