16 nm lithography process

Semiconductor lithography processes technology

1 nm • 18A
2 nm • 3 nm
5 nm • 7 nm
10 nm • 12 nm
14 nm • 16 nm
20 nm • 22 nm
28 nm • 32 nm
40 nm • 45 nm
55 nm • 65 nm
80 nm • 90 nm
110 nm • 130 nm
150 nm • 180 nm
220 nm • 240 nm
250 nm • 280 nm
350 nm • 500 nm
600 nm • 650 nm
700 nm • 750 nm
800 nm
1 µm • 1.2 µm
1.3 µm • 1.5 µm
2 µm • 2.5 µm
3 µm • 3.5 µm
5 µm • 6 µm
7 µm • 8 µm
10 µm • 16 µm
20 µm • 50 µm

The 16 nanometer (16 nm) lithography process is a full node semiconductor manufacturing process following the 20 nm process stopgap. Commercial integrated circuit manufacturing using 16 nm process began in 2014. The term "16 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. This technology is set to be replaced with 10 nm process in 2017.

Industry

Fab
Wafer

Fin Pitch
Fin Width
Fin Height
Contacted Gate Pitch
Interconnect Pitch (M1P)
SRAM bit cell

TSMC
300mm
Value	20 nm Δ
48 nm	N/A
? nm
? nm
90 nm	1.03x
64 nm	1.00x
0.07 µm²	0.55x

16 nm Microprocessors

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16 nm System on Chips

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16 nm Microarchitectures

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WikiChip

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Companies

Microarchitectures

Technology Nodes

Intel

AMD

ARM

Cavium

Samsung

Intel

AMD

Ampere

Apple

Cavium

HiSilicon

MediaTek

NXP

Qualcomm

Renesas

Samsung

Contents

Industry

16 nm Microprocessors

16 nm System on Chips

16 nm Microarchitectures