-
WikiChip
WikiChip
-
Architectures
Popular x86
-
Intel
- Client
- Server
- Big Cores
- Small Cores
-
AMD
Popular ARM
-
ARM
- Server
- Big
- Little
-
Cavium
-
Samsung
-
-
Chips
Popular Families
-
Ampere
-
Apple
-
Cavium
-
HiSilicon
-
MediaTek
-
NXP
-
Qualcomm
-
Renesas
-
Samsung
-
From WikiChip
10 µm lithography process
Semiconductor lithography processes technology |
|
The 10 µm lithography process was the semiconductor process technology used by the major semiconductor companies during the years of 1967 and 1973. The typical wafer size for this process at companies such as Fairchild and TI were 1.5 inch (38 mm).
Industry
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch |
Metal Layers |
Technology |
Wafer |
Intel | TI | RCA | Fairchild |
---|---|---|---|
1970 | 1969 | 1969 | |
? nm | ? nm | ? nm | ? nm |
? nm | ? nm | ? nm | ? nm |
2 | 2 | 2 | 2 |
PMOS | PMOS | PMOS | PMOS |
2" |
10 µm Microprocessors
This list is incomplete; you can help by expanding it.
Click to browse all 10 µm models
This article is still a stub and needs your attention. You can help improve this article by editing this page and adding the missing information. |