The 10 µm lithography process was the semiconductor process technology used by the major semiconductor companies during the years of 1967 and 1973. The typical wafer size for this process at companies such as Fairchild and TI were 1.5 inch (38 mm).

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch​
Metal Layers​
Technology

Intel	TI	RCA	Fairchild
1970	1969	1969
? nm	? nm	? nm	? nm
? nm	? nm	? nm	? nm
2	2	2	2
PMOS	PMOS	PMOS	PMOS

10 µm Microprocessors

• Intel
  • 4004
  • 4040
  • 8008

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