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Difference between revisions of "Template:lithography processes"

(Undo revision 82727 by 183.83.51.18 (talk) 12 is just an improved 14, it's not even a half node)
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:* [[7 nm lithography process|7 nm]]
 
:* [[7 nm lithography process|7 nm]]
 
:* [[5 nm lithography process|5 nm]]
 
:* [[5 nm lithography process|5 nm]]
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:* [[5 nm lithography process|4 nm]]
 
:* [[3 nm lithography process|3 nm]]
 
:* [[3 nm lithography process|3 nm]]
 
|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}
 
|}{{Navbar|Template:lithography processes|text=|mini=1|style=float:right;}}

Revision as of 02:20, 4 March 2019

basic wafer drawing.svg Semiconductor lithography processes technology
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