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Difference between revisions of "7 nm lithography process"
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== 7 nm Microprocessors== | == 7 nm Microprocessors== |
Revision as of 15:27, 6 December 2016
The 7 nanometer (7 nm) lithography process is a full node semiconductor manufacturing process following the 10 nm process node. The term "7 nm" is simply a commercial name for a generation of a certain size and its technology, as opposed to gate length or half pitch. Commercial mass production of integrated circuit using 7 nm process is set to begin sometimes in 2019 or 2020. This technology will be replaced by 5 nm process around 2022.
Industry
Fab |
---|
Process Name |
1st Production |
|
Fin Pitch |
Fin Width |
Fin Height |
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell (HP) |
SRAM bit cell (HD) |
Intel | Samsung | TSMC | GlobalFoundries | IBM | |||||
---|---|---|---|---|---|---|---|---|---|
P1276 | |||||||||
Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ | Value | 10 nm Δ |
? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
? nm | ?x | 48 nm[1] | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
? nm | ?x | 36 nm[2] | ?x | ? nm | ?x | ? nm | ?x | ? nm | ?x |
? µm² | ?x | ? µm² | ?x | ? µm² | ?x | ? µm² | ?x | ? µm² | ?x |
? µm² | ?x | ? µm² | ?x | 0.027 µm²[3] | ?x | ? µm² | ?x | ? µm² | ?x |
7 nm Microprocessors
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7 nm Microarchitectures
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