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Difference between revisions of "750 nm lithography process"

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{{lithography processes}}
 
{{lithography processes}}
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The '''750 nm lithography process''' is was semiconductor manufacturing process following the [[1 µm lithography process|1 µm process]]. Commercial [[integrated circuit]] manufacturing using 700 nm process began in early 1990s. 500 nm and was phased out and later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes.
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The '''750 nm lithography process''' is was semiconductor manufacturing process following the [[1 µm lithography process|1 µm process]]. Commercial [[integrated circuit]] manufacturing using 750 nm process began in early 1990s. 750 nm and was phased out and later replaced by [[650 nm]], [[600 nm]], and [[500 nm]] processes.
  
 
== Industry ==
 
== Industry ==

Revision as of 01:05, 15 May 2016

basic wafer drawing.svg Semiconductor lithography processes technology
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The 750 nm lithography process is was semiconductor manufacturing process following the 1 µm process. Commercial integrated circuit manufacturing using 750 nm process began in early 1990s. 750 nm and was phased out and later replaced by 650 nm, 600 nm, and 500 nm processes.

Industry

Fab
Process Name​
1st Production​
Contacted Gate Pitch​
Interconnect Pitch (M1P)​
Metal Layers​
SRAM bit cell
DEC HP
CMOS-4 CMOS26B
1992 1994
 ? nm  ? nm
 ? nm  ? nm
3 3
 ? µm2  ? µm2

750 nm Microprocessors

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750 nm Microarchitectures

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