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Difference between revisions of "80 nm lithography process"
(Created page with "{{lithography processes}} The '''80 nm lithography process''' is a half-node semiconductor manufacturing process used as a stopgap between the ...") |
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Revision as of 03:44, 27 April 2016
Semiconductor lithography processes technology |
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The 80 nm lithography process is a half-node semiconductor manufacturing process used as a stopgap between the 90 nm and 65 nm processes. Commercial integrated circuit manufacturing using 40 nm process began around 2004. This technology superseded by commercial 65 nm process by 2006.
Industry
Fab |
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1st Production |
Wafer |
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Contacted Gate Pitch |
Interconnect Pitch (M1P) |
SRAM bit cell |
TSMC | Samsung | ||
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2005 | 2005 | ||
300mm | |||
Value | 90 nm Δ | Value | 90 nm Δ |
? nm | ?x | ? nm | ?x |
? nm | ?x | ? nm | ?x |
? µm2 | ?x | ? µm2 | ?x |
80 nm Microprocessors
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80 nm System on Chips
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