-
WikiChip
WikiChip
-
Architectures
Popular x86
-
Intel
- Client
- Server
- Big Cores
- Small Cores
-
AMD
Popular ARM
-
ARM
- Server
- Big
- Little
-
Cavium
-
Samsung
-
-
Chips
Popular Families
-
Ampere
-
Apple
-
Cavium
-
HiSilicon
-
MediaTek
-
NXP
-
Qualcomm
-
Renesas
-
Samsung
-
From WikiChip
Difference between revisions of "240 nm lithography process"
(Created page with "{{lithography processes}} The '''240 nm lithography process''' is was semiconductor manufacturing process following the 350 nm process. Commerci...") |
(No difference)
|
Revision as of 00:28, 27 April 2016
Semiconductor lithography processes technology |
|
The 240 nm lithography process is was semiconductor manufacturing process following the 350 nm process. Commercial integrated circuit manufacturing using 240 process began in late 1990s. 240 nm and was phased out and later replaced by 220 nm and 180 nm processes.
Industry
Fab |
---|
Process Name |
1st Production |
Contacted Gate Pitch |
Interconnect Pitch (M1P) |
Metal Layers |
SRAM bit cell |
Fujitsu |
---|
CS-70 |
1997 |
? nm |
? nm |
? |
? µm2 |
240 nm Microprocessors
- HAL (Fujitsu)
This list is incomplete; you can help by expanding it.